High-density uniformly aligned silicon nanotip arrays and their enhanced field emission characteristics
نویسندگان
چکیده
High-density (,10/cm), uniformly aligned silicon nanotip arrays are synthesized by a plasma-assisted hot-filament chemical vapor deposition process using mixed gases composed of hydrogen, nitrogen and methane. The silicon nanotips grow along k112l, and are coated in situ with a ,3 nm thick amorphous carbon film by increasing the methane concentration in the source gases. In comparison to the uncoated silicon nanotips arrays, the coated tips have enhanced field emission properties with a turn-on field of 1.6 V/mm (for 10 mA/cm) and threshold field of 3 V/mm (for 10 mA/cm), suggesting their potential applications for flat panel displays. q 2003 Elsevier Science Ltd. All rights reserved. PACS: 81.05.Zx; 81.15.Gh; 79.70. þ Q
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